Warpage Measurement_Metrology _yuray-tech

Warpage Measurement

Non-contact warpage and bow measurement evaluates wafer flatness across 4–12 inch wafers for process control and quality verification.
Application Scenarios: Warpage test, bow measurement, wafer flatness evaluation.
Classic Standard: SEMI G86 / ASTM F534.
Charging Standard: 1,000 RMB per instance/test.

0.1 – 500 μm
Warpage Range
± 0.5 μm
Measurement Accuracy
Shadow Moiré
Measurement Method
4 – 12"
Wafer Size
1,000 RMB/test
Pricing

OVERVIEW

YURAY provides warpage measurement services for full-field, non-contact topography and deformation analysis of wafers, substrates, and packages. Using shadow moiré and phase-shift techniques, our platform characterizes bow, warpage, and twist with micron-level accuracy across the entire surface. We support room-temperature and thermal (reflow-simulation) warpage measurement — enabling process monitoring, package reliability assessment, and advanced packaging development.

1,000 RMB/test
Pricing

SERVICES

Our warpage measurement platform enables full-field non-contact topography analysis — supporting wafer-level and package-level deformation characterization with thermal capability for reflow and reliability assessment.

Wafer & Substrate Warpage Mapping

Full-field non-contact warpage measurement of wafers and substrates — characterizing bow, warpage, and twist across the entire surface with micron-level accuracy for process monitoring and quality control.

TECHNICAL SPECIFICATIONS
Parameter Specification
Warpage Range0.1 – 500 μm
Measurement Accuracy± 0.5 μm
Measurement MethodShadow moiré / phase-shift
Measured ParametersBow, warpage, twist
Wafer Size4 / 6 / 8 / 12 inch
Output3D map + contour data
Measurement Speed≤ 60 sec per wafer

Package Warpage & Thermal Deformation

Temperature-dependent warpage measurement for packages and substrates — enabling reflow-simulation analysis, thermal-deformation characterization, and reliability assessment of advanced packaging structures.

TECHNICAL SPECIFICATIONS
Parameter Specification
Temperature RangeRT – 260 °C
Warpage Range0.1 – 500 μm
Measurement Accuracy± 1 μm
Package TypesBGA, QFN, SiP, PoP, substrate
AnalysisWarpage vs. temperature curve
Output3D maps + temperature curves
Sample SizeUp to 300 mm
1,000 RMB/test
Pricing

CASE STUDY

At YURAY, we provide end-to-end full-chain metrology services. Below is a detailed look at how we translate stringent customer Statement of Work (SOW) requirements into delivered, proven warpage characterization results.

[end-to-end service]

Post-Bond Wafer Warpage Characterization

Key Process
  • Full-field shadow-moiré warpage mapping
Additional Processing
  • Sample Supply — 12-inch bonded wafer pair (3 units), incoming inspection and wafer registration
  • 3D topography analysis
  • Full-surface non-contact scanning
  • Analysis — Radial warpage distribution analysis
  • Metrology — 3x repeat measurement
Key Specifications
  • 3 wafers received & logged
  • Average warpage: 32 μm
  • Bow: 28 μm, Twist: 9 μm
  • 100% surface mapped
  • Center-edge profile delivered
  • Repeatability: ± 0.3 μm
Key Deliverables
  • 3D maps, contour data, and analysis consolidated
  • Final characterization report delivered
[end-to-end service]

Package Warpage vs. Temperature Analysis

Key Process
  • Thermal warpage measurement across reflow profile
Additional Processing
  • Sample Supply — BGA package samples (5 units), incoming inspection and sample registration
  • High-temperature shadow-moiré mapping
  • Analysis — Curve generation and inflection analysis
  • Analysis — Statistical comparison of 5 samples
  • Metrology — Full-field 3D maps at key temperatures
Key Specifications
  • 5 samples received & logged
  • Full temperature curve acquired
  • Peak warpage: 78 μm @ 217 °C
  • Warpage curve delivered
  • Sample-to-sample comparison delivered
  • 3D maps at RT / peak / cool-down
Key Deliverables
  • Maps, curves, and analysis integrated
  • Final characterization report delivered


METROLOGY & QUALITY ASSURANCE

Reliable Deposition Quality, Complimentary Characterization Included At YURAY, deposition service means more than simply depositing a film. We combine qualified equipment, controlled processes, experienced engineering support, and rigorous quality management to deliver stable, repeatable thin-film performance. Every project can be supported with a free comprehensive characterization report, providing customers with transparent and actionable quality data. Depending on the service requirements, reports may include film thickness, uniformity, surface condition, adhesion, composition, and other relevant characterization results. Choose YURAY for high-quality film deposition, responsive technical support, and verified results—without additional reporting costs

SOW Requirements

Quantified SOW Requirements

YURAY converts SOW requirements into measurable criteria, defining clear quality targets and inspection standards.

Process Improvement

Continuous Process Improvement

YURAY identifies root causes of issues, such as interface peeling, and implements effective corrective solutions.

Characterization Reports

SOW-Aligned Characterization Reports

YURAY delivers characterization reports with indicators directly aligned to SOW requirements for transparent verification.

Third-Party Confirmation

Third-Party Double Confirmation

YURAY uses independent third-party laboratories to double-confirm critical indicators through characterization and inspection.



Need a Custom Wafer or Fabrication Process?

Share your drawings, wafer specifications, or project requirements — our engineering team will prepare a technical proposal and quote within one business day.